Atomic Layer Deposition：Fundamentals and Applications

Speaker: Prof. Gregory N. Parsons (NCSU)

Time and Date: 10:00-11:30, Jun. 5, 2013

Place: Room B213, Microelectronics Building, Handan Campus

Abstract

Our research group explores chemical reactions during vapor phase atomic layer deposition (ALD) and related molecular layer deposition (MLD) processes to prepare nanoscale thin film semiconductors, metals, insulators, and polymers for electronic, structural, protective and other applications. We find that ALD offers unique opportunities in surface and materials engineering. For example, we find that a low - cost chemically inert polymer such as polypropylene can be conformally coated with a nanoscale ceramic coating that makes it chemically functional without changing the material’s flexibility or weight. We also find that vapors can infuse into some polymers and react with functional groups in the polymer backbone or side-chain to modify the physical and chemical structure of the polymer. Our fundamental findings impact a range of applications. For example, we find that ALD coatings can act as nucleation layers to allow further crystal growth for high-rate photocatalytic organic degradation. We are also working under NSF funding to identify challenges in process scaling to atmospheric pressure. This presentation will include an overview of ALD surface reaction chemistry, including examples of materials of future interest.

Biography

Gregory N. Parsons is A lcoa Professor of Chemical and Biomolecular Engineering at North Carolina State University. He received a PhD in Physics from NC State University in 1990 in the area of amorphous silicon and related materials for thin film photovoltaics. From 1990 to 1992 he did post-doctoral work at IBM TJ Watson Research Center, Yorktown Heights NY in the area of thin film transistor materials for flat panel displays, where he earned an IBM Invention Achievement Award for his work in “Pulsed Gas Plasma Enhanced Deposition of Silicon”. He joined NC State Chemical Engineering as Assistant Professor in 1992 and became professor in 2002. In 2006 he launched NC State University’s Nanotechnology Initiative to address fundamental understanding of nanomaterials and nanoscale processing, and he currently serves as the Initiative Director. Professor Parsons’ research focuses on surface chemistry and chemical processing of thin film materials by atomic and molecular layer deposition, including investigations of nanoscale