CMP Applications for the Fabrication of Power MOS and MEMS Devices

Speaker: Dr. Gerfried Zwicker (Fraunhofer Institute)

Time and Date: 9:35-10:30, Nov. 5, 2013

Place: Room 205, Guanghua Building, Handan Campus

Abstract

It will cover a short introduction in Fraunhofer in general and in Fraunhofer Institute for Silicon Technology ISIT. Then I will summarize CMP for IC fabrication and will show emerging CMP applications in Power Devices and MEMS. For that I will give examples from our PowerMOS and IGBT activities and present examples, where CMP is used for the fabrication of an angular rate sensor and an infrared digital micro mirror device. This leads to some results of Cu CMP with Reactive Liquid for MEMS. Finally I will show the principles of a MEMS mirror based laser scanning projector for automotive applications.

Biography

Dr. Gerfried Zwicker is head of the CMP group at Fraunhofer Institute for Silicon Technology ISIT in Itzehoe, which is lying about 50 km north of Hamburg in Germany. He has studied physics at the Technical University Berlin where he worked on electroluminescence of II-VI semiconductors for his diploma. At Fritz-Haber-Institute, also in Berlin, he investigated surface properties of ZnO crystals for his dissertation. He joined the Fraunhofer Institute for Microstructure Technology IMT in 1985, where he worked on CMOS Technology by using x-ray lithography with an emphasis on reactive ion etching RIE. After his move to Fraunhofer ISIT in Itzehoe in 1995 he concentrated on Chemical Mechanical Polishing CMP and was responsible for CMP tool development, consumables evaluation and process adoption for MEMS and powerMOS applications.Gerfried Zwicker is founder and organizer of the European CMP Users Meeting since around 15 years and is member of the Executive Committee of the International Conference on Planarization/CMP Technology ICPT. He is author/coauthor of more than 50 scientific and technical publications and book contributions and is co-inventor of 3 patents on semiconductor technology.