Sub-10-nm sized dot arrays and half-pitch lines formed using electron beam drawing and PS-PDMS self-assembly

Speaker:Prof.Sumio Hosaka (Gunma University)

Time and Date: 10:00- , Jun. 30, 2014

Place: Room 138, Physics Building, Handan Campus

 

 

Abstract

We have studied fabrication of nanodot arrays with a diameter of <10 nm using PS-PDMS s elf-assembly and EB drawing with HSQ negative EB resist. As the results, we demonstrated that graphoepitaxy could possibly achieve sub-10-nm-dot arrays ordered along EB-drawn guide lines. Using 15-nm-wide guide lines, 18 and 7 sub-10-nm sized dot arrays between the guide lines were achieved with a MW of 14.6 and 8.5 kg/mol in PS-PDMS, respectively. Furthermore, we demonstrated to fabricate 7-nm-wide half-pitched lines ordered along the guide lines using 14. 6-kg/mol-BCP self-assembly with a region of sphere structure in micro-phase separation diagram.

 

 

Biography

Sumio hosaka was born in Japan in 1948. He received the Ph. D. degree in Engineering from Waseda University, Tokyo, in 1983.He joined the Hitachi Central Research Lab. (HCRL), Co. Ltd. Kobunji, Tokyo in 1971, working in semiconductor lithography using electron, ion and light beams, nano-metrology using electron beam and scanning probe microscope (SPM) techniques, in HCRL and terabyte huge storage using SPM in the Hitachi Advanced Research Lab. (HARL). After he joined the Hitachi Kenki Co., Tsuchiura, Ibaraki in 2000, working in-line atomic force microscope products, he joined Department of electronic engineering, Gunma University, Kiryu, Gunma, in 2001. Since 2001, He has been professor in the university, and is working on nano devices such as QCAS (Quantum Conductance Atomic Switching) and phase change memory, nano fabrication such as EB drawing and self-assembled nano dot arrays, and nano metrology based on SPM. After retirement in 2014 spring, he is project professor in Gunma University.